Photopolymerizable composition

ABSTRACT

A composition that is photopolymerizable upon absorption of light and/or heat, the composition including a binder, a polymerizable compound, a sensitizer, and a photoinitiator, characterized in that the composition includes, with respect to its non-volatile compounds, at least about 0.01 wt. % of a polythiol compound and has a very high sensitivity and hardness.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a composition that isphotopolymerizable upon absorption of light, the composition including abinder, a polymerizable compound, a sensitizer, and a photoinitiator.

The present invention also relates to a photopolymer printing plateprecursor including the photopolymerizable composition, and relates to amethod of making a lithographic printing plate therewith.

2. Description of the Related Art

Compositions that are photopolymerizable on absorption of light are wellknown in the art. Such compositions usually include a binder, apolymerizable compound, a sensitizer, and a photoinitiator and aredisclosed in, for example, EP 1 349 006 A. From this document it is alsoknown, that radical chain transfer agents, as described in EP 107 792,can be used to achieve a high sensitivity and that such radical chaintransfer agents preferably are sulfur compounds like the mono-thiols2-mercaptobenzothiazole, 2-mercaptobenzoxazole, or2-mercaptobenzimidazole.

As there is an ongoing trend to expose the photopolymerizablecompositions with low power light sources like laser-LEDs, thesensitivity of the known compositions including mono-thiols is stillunsatisfactory. Moreover, the optimization of photopolymerizablecompositions and of printing plate precursors often is accompanied by aloss in sensitivity. This is, for example, the case when stabilizing thecomposition against environmental effects or when limiting theabsorption spectra to allow for room light handling. Therefore, it isnecessary to compensate for such a sensitivity loss.

Specific aliphatic polythiols for radiation curable compositions areknown from, for example, U.S. Pat. No. 4,120,721, wherein thecomposition forms a solid cured polythioether on exposure, but does notdisclose a sensitizer plus photoinitiator system in combination withspecific polythiols. The same is true for U.S. Pat. No. 3,993,549,wherein the composition is based on a particulate urea; FR 2,227,558;U.S. Pat. No. 3,753,720; U.S. Pat. No. 3,676,195; and U.S. Pat. No.3,661,744.

Aliphatic thiols that have a branched structure in α- and/or β-positionof the mercapto group are disclosed in WO 03/72614 and JP 2003-252918 A2to be suitable for a high sensitivity of photosensitive compositions,wherein JP 2003-252918 A2 discloses such compounds in combination withorganoboron complexes.

The use of organoboron complexes is also taught in EP 1 031 579, whereinsuch boron complexes are combined with a thiol-group-containingcompound, that preferably is selected from 5 specific compounds withone, three, or four thiol groups.

The polythiols are usually disclosed in the prior art to take part inthe photocuring process and to react in combination with electron richor electron poor polyenes by the thiol-ene mechanism. Therefore, theyare commonly used in similar stoichiometric amounts as the polyenes andselected in view of the solid polythioether products that are formed bythis reaction. Although the invention underlying, for example, WO03/72614 is said to achieve a high sensitivity, it is disclosed on page30 of this document that a super-high pressure mercury lamp, metalhalide lamp, xenon lamp and the like is generally used as the lightsource and the example compositions only have a sensitivity of no higherthan 10 mJ/cm². This demonstrates the unsatisfactory sensitivity of thecompositions of the prior art. As for low power light sources, thesensitivity has to be significantly higher than 1 mJ/cm² and, therefore,has to be in the μJ/cm² region (a lower numerical value corresponds to ahigher sensitivity, see below).

Therefore, there still is a need to find further thiol compounds and aphotopolymerizable composition optimized for such compounds, thatresults in a very high sensitivity, because a broader range of compoundsgives a better chance to optimize the photopolymerizable composition, inparticular, those including a binder, a polymerizable compound, asensitizer, and a photoinitiator.

Optimization with respect to the properties and the costs as well isparticularly important when using the photopolymerizable composition forthe preparation of a lithographic printing plate precursor.

In addition, the known photopolymerizable compositions are stillunsatisfactory in that they are not resistant enough after exposure andprocessing. In particular, the problem that known photopolymerizablecompositions are not hard enough results, for example, when they areused in a lithographic printing plate precursor for a printing platemade from such a precursor that has a short printing lifetime. Theprinting lifetime is also called run-length on the press.

In lithographic printing, a so-called printing master, such as aprinting plate, is mounted on a cylinder of the printing press. Themaster carries a lithographic image on its surface and a printed copy isobtained by applying ink to the image and then transferring the ink fromthe master onto a receiver material, which is typically paper. Inconventional, so-called “wet” lithographic printing, ink as well as anaqueous fountain solution (also called dampening liquid) are supplied tothe lithographic image which consists of oleophilic (or hydrophobic,i.e., ink-accepting, water-repelling) areas as well as hydrophilic (oroleophobic, i.e., water-accepting, ink-repelling) areas. In so-called“driographic” printing, the lithographic image consists of ink-acceptingand ink-adhesive (ink-repelling) areas and during driographic printing,only ink is supplied to the master.

Printing masters are generally obtained by the so-calledcomputer-to-film (CtF) method, wherein various pre-press steps such astypeface selection, scanning, color separation, screening, trapping,layout, and imposition are accomplished digitally and each colorselection is transferred to graphic arts film using an image-setter.After processing, the film can be used as a mask for the exposure of animaging material called a plate precursor and after plate processing, aprinting plate is obtained which can be used as a master. Since about1995, the so-called ‘computer-to-plate’ (CtP) method has gained a lot ofinterest. This method, also called ‘direct-to-plate’, bypasses thecreation of film because the digital document is transferred directly toa printing plate precursor by means of a so-called plate setter. Aprinting plate precursor for CtP is often called a digital plate.

Digital plates can roughly be divided into three categories: (i) silverplates, which work according to the silver salt diffusion transfermechanism; (ii) photopolymer plates which contain a photopolymerizablecomposition that hardens upon exposure to light; and (iii) thermalplates of which the imaging mechanism is triggered by heat or bylight-to-heat conversion. Thermal plates are mainly sensitized forinfrared lasers emitting at 830 nm or 1064 nm. Typical photopolymerplates are sensitized for visible light, mainly for exposure by an Arlaser (488 nm) or a FD-YAG laser (532 nm). The wide-scale availabilityof low cost blue or violet laser diodes, originally developed for datastorage by means of DVD, has enabled the production of plate settersoperating at a shorter wavelength. More specifically, semiconductorlasers emitting from 350 nm to 450 nm have been realized using an InGaNmaterial.

Radicals are involved in the hardening reaction of thephotopolymerizable composition of photopolymer plates and the hardeningreaction is known to be adversely affected by oxygen. To reduce thisproblem, it is known to provide the photosensitive coating with aprotective coating, also called an oxygen barrier layer, protectiveovercoat, or overcoat layer.

After imaging (exposing) the photopolymer printing plate precursor, theplate is heated for a short time to high temperatures before theovercoat is washed off and the photolayer is developed. This heatingstep is hereinafter called a pre-heat step. During the pre-heat step,typical temperatures, when measured at the back of the plate, from about90° C. to about 150° C. are used for a short time, typically betweenabout 10 seconds and about 1 minute. As the conditions of the pre-heatstep vary with different types of processors and even for the sameprocessor, a printing plate should exhibit consistent resultsirrespective of the pre-heat conditions, in particular the temperature.The range of pre-heat conditions, wherein a printing plate exhibitsconsistent results, is called the pre-heat latitude of the plate.

SUMMARY OF THE INVENTION

In order to overcome the problems described above, preferred embodimentsof the present invention provide a highly sensitive composition that isphotopolymerizable on absorption of light and, in particular, such acomposition that is suitable to prepare a photopolymer printing plateprecursor.

Another preferred embodiment of the present invention is a composition,that, when coated on a support to obtain a lithographic printing plateprecursor, is hard enough after imaging and processing to result inprinting plate that has a long lifetime when used for printing.

Another preferred embodiment of the present invention is a photopolymerprinting plate precursor including the composition of the preferredembodiment above. The printing plate precursor may be a flexographic ora lithographic printing plate precursor, the latter being highlypreferred. Also, a method of making a lithographic printing platewherein the printing plate precursor is image-wise exposed andthereafter developed, is another preferred embodiment of the presentinvention. Preferred photopolymer printing plate precursors according tothe present invention can be exposed with an energy density, measured onthe surface of the plate, of approximately 100 μJ/cm² or less. Preferredembodiments of the photopolymerizable composition, of the printing plateprecursor, and of the method of making a lithographic printing plateaccording to preferred embodiments of the present invention aredescribed below.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

A preferred embodiment of the present invention relates to a compositionthat is photopolymerizable upon absorption of light, the compositionincluding a binder, a polymerizable compound, a sensitizer, aphotoinitiator, and a polythiol compound, wherein the compositionincludes, with respect to its total solid (dried; non-volatile) weight,at least about 0.01 wt. % (weight %), preferably from about 0.01 wt. %to about 20 wt. %, more preferably from about 0.1 wt. % to about 10 wt.%, and more preferably from about 0.1 wt. % to about 5 wt. % of thepolythiol compound and the polythiol compound is selected from one ofthe following formulae (I), (II), (IIIa), (IIIb) or (IV):

wherein

X¹ means O, S, Se, or NR⁵;

L¹ means a linking group or a single bond;

R¹ to R⁵ mutually independent mean H, a non-metal atom substituent, orL¹;

m is an integer from 1 to 100; and

for the case that m is 1, L¹ includes at least one additional thiolgroup;

wherein

X² represents O, S, Se, or NR⁶;

Y¹, Y² mutually independent mean N or CR⁷;

L² means a linking group or a single bond;

R⁶, R⁷ mutually independent mean H, a non-metal atom substituent, or L²;

n is an integer from 1 to 100; and

for the case that n is 1, L² includes at least one additional thiolgroup;

wherein

R⁸ mutually independent means H or a non-metal atom substituent;

A¹, A² mutually independent mean a linear alkyl chain with at most 16carbon atoms;

L³, L⁴ mutually independent mean linking groups or single bonds;

s means an integer from 1 to 100;

r means 1, 2, 3, or 4;

the product of s times r is 2 or an integer greater than 4; and

for polythioles of formula (IIIa), R⁸ means methyl or ethyl; or

-   -   an oligomer, polymer, or copolymer (IV),        wherein

the oligomer, polymer, or copolymer includes at least six SH-groups permolecule; and

the thiol groups of formulae (I), (II), (IIIa), (IIIb) or (IV) may alsobe present in their tautomeric thione form.

A linking (linkage) group is defined in the context of preferredembodiments of the present invention to be a single bond, anysubstituted or unsubstituted atom, or any substituted or unsubstitutedatom group, wherein a preferred substituent is a thiol group or includesa thiol group.

Preferably L¹, L², and L⁵ (L⁵ is introduced below) mutually independentmean substituted or unsubstituted alkylene, alkyleneoxy, alkylenethio,oxygen, sulfur, amino, alkylamino, amido, alkylamido, sulphonyl,acyloxy, or alkylsiloxane; or an alkylene chain containing acyloxy,ether, carbonate, thioether, hydroxy, phenyl, heterocylic, amino, thiol,sulphonyl, amido, glycerol monoether, urethane, or urea functions; andL³, L⁴ mutually independent mean substituted or unsubstituted alkylene,alkyleneoxy or polyglycerol; or an alkylene chain containing acyloxy,ether, carbonate, thioether, hydroxy, phenyl, heterocylic, amino, thiol,sulphonyl, amido, urethane, or urea functions.

The linkage group of the preferred embodiments of the present inventionhas an appropriate valency. As an example, for compounds of formula (I)wherein m is 2, the linkage group L¹ has a valency of 2 and can be asingle bond, a bivalent atom like oxygen, or bivalent atom group likemethylene. Therefore, the groups (radicals) disclosed above to bepreferred linking groups are meant to be representatives for thecorresponding radicals having a different valency that are alsopreferred linkage groups in the context of preferred embodiments of thepresent invention. As an example the alkylene radical, is meant toinclude alkyl, alkylene, and even alkyl radicals with more than twovalencies.

For compounds of formula (I), wherein m means 1, it is particularlypreferred, if L¹ means a compound of formula (II), wherein n means 1. Inthe context of preferred embodiments of the present invention such mixedcompounds are summarized under formula (I) as follows:

In a particularly preferred embodiment of the present invention, L², L²,and L⁵ mutually independent mean alkylene, alkylenethio, or alkyleneoxy;or phenylene.

For preferred embodiments of the present invention, the followingsubstitution and composition of polythiols (I) to (IV) are particularlypreferred.

Compounds of formula (I), wherein L² means —X³-A³-X⁴— or divalentphenylene, in particular linear, branched, or cyclic alkyl; and/or R¹and R⁴ mean H; and/or X² means O, S, NH, or N—R⁵; and/or R², R³, and R⁵mutually independent mean L¹, H, or methyl; and/or A³ means a linear,branched, or cyclic alkylene chain or divalent phenylene; and/or X³, X⁴mutually independent mean CH₂, O, S, NH, or N-methyl and/or m means 2 to100, in particular 2.

Compounds of formula (II), wherein X² means S, O, NH, or N—R⁶; and/orY², Y² mutually independent mean CR⁷ or N; and/or L² means —X⁵-A⁴-X⁶— ordivalent phenylene; and/or R⁶, R⁷ mutually independent mean L², H, ormethyl; and/or A⁴ means a linear, branched, or cyclic alkylene chain ordivalent phenylene; and/or X⁵, X⁶ mutually independent mean CH₂, O, S,NH, or N-methyl; and/or n means 2 to 100, in particular 2.

Compounds of formula (IIIa) or (IIIb), wherein R⁸ means hydrogen,methyl, or ethyl; and/or s means 1; and/or L³ means alkylene; and/or L⁴means alkylene; and/or A¹ and A² mean a linear alkylene chain containingup to 16 carbon atoms; and/or r means 2.

Compounds of formula (IV), wherein the oligomer, polymer, or copolymerincludes at least six SH-groups per molecule.

Compounds of formula (IV), wherein the oligomer, polymer, or copolymerhas a molecular weight of at least 500, in particular of at least 1,000.

Compounds of formula (IV), wherein the oligomer, polymer, or copolymercontains up to 10,000 SH-groups per molecule.

Compounds of formula (IV), wherein the SH group is linked to theoligomer, polymer, or copolymer chain as shown in formula (V):

wherein L⁵ means a linking group; R¹², R¹³ mutually independent mean Hor a non-metal atom substituent; and t means an integer of at least 2,preferably of at least 6, and more preferably from 6 to 10,000.Compounds of formula (IV), wherein the oligomer, polymer, or copolymerincludes monomeric units of formula (VI):

wherein

D¹ means SiR¹⁴, CH, or CR¹⁴, in particular SiR¹⁴;

B¹ means O if D¹ means SiR¹⁴;

B¹ means CH₂ or CH-alkyl if D¹ means CH or CR¹⁴;

R¹⁴ means a substituted or unsubstituted alkyl chain with 1 to 12 carbonatoms;

R¹⁵ means a substituted or unsubstituted alkylene group or an alkylchain containing acyloxy, ether, carbonate, thioether, hydroxy, phenyl,heterocylic, amino, thiol, sulphonyl, amido, glycerol monoether,urethane, or urea functions; and

u means an integer of at least 2, preferably of at least 6, and morepreferably from 6 to 10,000.

In another preferred embodiment of the present invention the oligomer,polymer, or copolymer has a hyperbranched structure and includes atleast 6 thiol groups per molecule. Compounds with a hyperbranchedstructure are, e.g, derived from multi-functional compounds such aspolyglycerols which can have many free hydroxy groups and the hydroxygroups can be functionalized by esterification with, e.g., HSCH₂CH₂CO₂Hto form the multi-functional thiols of the preferred embodiments of thepresent invention. An example of a hyperbranched compound can be foundin Angew. Chem. Int. Ed., 1999, 38, 3552.

The polythiols of preferred embodiments of the present invention can beobtained by known synthetic methods.

Examples of preferred compounds of formulae (I) to (IV) are given in thefollowing.

In the aforementioned formulae (IV-2) to (IV-7) the value of v ispreferably in the range from about 20 to about 5,000, and morepreferably from about 50 to about 1,000.

Surprisingly, it has been found that there is a positive interactionbetween the polythiols of the preferred embodiments of the presentinvention with a composition including a binder, a polymerizablecompound, a sensitizer, and a photoinitiator. Only if these ingredientsare present, is it possible to achieve a high sensitivity and a highhardness, and the positive interaction is particularly pronounced, ifthe polymerizable compound includes at least one of the followingN-containing groups: primary, secondary, or tertiary amino, urethane, orurea. Although the underlying mechanism is not completely understood, ithas to be different from the thiol-ene mechanism known from the priorart discussed above. This is because the polythiols of the preferredembodiments of the present invention are even effective at very lowlevels and need not be in stoichiometric relation to the polymerizablecompounds of the composition. Even at such low levels an exceptionallyhigh sensitivity and hardness of the composition is achieved.

Moreover, the positive interaction described above is particularlypronounced, if the photoinitiator is a hexaaryl-bisimidazole compound ora metallocene compound, in particular a hexaaryl-bisimidazole compound.Although these photoinitiators are known to increase the sensitivity ofknown photopolymerizable compositions, the increase in sensitivity ishigher in combination with the polythiols of the preferred embodimentsof the present invention. Therefore, it is preferred for the compositionthat the photoinitiator is a hexaaryl-bisimidazole compound.

In a preferred embodiment of the present invention, the composition whencoated on a support has a sensitivity of about 150 μJ/cm² or higher,preferably about 100 μJ/cm² or higher, and more preferably of about 60μJ/cm² or higher.

The sensitivity of the composition as defined in the context of thepreferred embodiments of the present invention is the sensitivity of aprinting plate precursor obtained by coating the composition in a drythickness of about 1.5 g/m² on an electrochemically roughened andanodically oxidized aluminum sheet as described in the Examples inparagraph A, and coating on top of the so obtained photosensitive layeran overcoat layer as defined by Table 3 of the Examples in a drythickness of 2.0 g/m². The sensitivity of the printing plate precursoris then measured by imaging through a 13-step exposure wedge withdensity increments of 0.15 per step using the imaging conditionsdescribed in the Examples. The sensitivity is then defined to be theminimum energy density that is necessary for a complete hardening ofthree wedge steps, wherein the coating is considered as being completelyhardened when the density of the material is at least about 97% of thedensity of a plate which has been exposed without a filter. So, a highernumber (numerical value) of the minimum energy density represents alower sensitivity.

The composition of preferred embodiments of the present invention caninclude a radical stabilizer that can be selected from known radicalstabilizers to avoid unwanted polymerization. Compounds useful asradical stabilizers for the composition are also known as antioxidantsor radical scavengers that are used as additives for, e.g., polymers.Preferably, the radical stabilizer used in preferred embodiments of thepresent invention is a compound selected from the group consisting ofphenoles, organic phosphites, organic phosphonites, amines,hydroxylamines, lactones, hydrochinones, divalent sulfur compounds likethioethers and thioesters, metal complexants, wherein phenoles includemono-, di- and trihydroxyphenyl compounds, and in particular the radicalstabilizer is a compound selected from the group consisting of hinderedphenoles, O-alkylated hydrochinones, organic phosphites, organicphosphonites, aromatic amines, hindered amines, dialkyl hydroxylamines,benzofuranones, and dialkyl thiodipropionates.

The photosensitive coating according to preferred embodiments of thepresent invention can include one, two, three or more different radicalstabilizers. In the case where it contains more than one radicalstabilizer, the compounds can belong to the same or different classes.

The radical stabilizers of the preferred embodiments are preferablyincorporated in the photopolymerizable composition in an amount of about0.01 to about 5 wt. %, in particular from about 0.015 to about 3 wt. %,with respect to the total weight of the non-volatile compounds of thephotopolymerizable composition.

Although the composition can include a radical stabilizer as disclosedabove, it surprisingly also gives very good results without using such acompound. Therefore, it is also a preferred embodiment of the presentinvention wherein the photopolymerizable composition contains no radicalstabilizer as defined above.

Although preferred embodiments of the present invention are also usefulfor compositions that are photopolymerizable upon absorption of redand/or infrared radiation, it is preferred for those compositions thatare photopolymerizable upon absorption of light with a wavelength ofabout 600 nm or less, which includes the green, blue, and ultravioletspectral range. A sensitizing dye (sensitizer) preferably used in thepresent invention, when incorporated in the photopolymerizablecomposition, has an absorption wavelength ranging from about 300 nm toabout 600 nm, preferably from about 350 nm to about 430 nm, and morepreferably from about 360 nm to about 420 nm, and makes the photopolymerprinting plate sensitive to light within these wavelength ranges.

In a preferred embodiment of the present invention, a sensitizer havinga solubility in methyl ethyl ketone of at least about 15 g/kg,preferably from about 15 g/kg to about 250 g/kg, measured at 20° C. ispreferably used.

The known sensitizing dyes can be used in the composition of thepreferred embodiments of the present invention. Suitable classes includedialkylaminobenzene compounds like (S-Ia) and (S-Ib)

wherein each of R¹ to R⁴, which are independent of one another, is analkyl group having 1 to 6 carbon atoms (C₁₋₆ alkyl group), and each ofR⁵ to R⁸ is a hydrogen atom or a C₁₋₆ alkyl group, provided that R¹ andR², R³ and R⁴, R¹ and R⁵, R² and R⁶, R³ and R⁷, or R⁴ and R⁸, may bebonded to each other to form a ring;

wherein each of R⁹ and R¹⁰, which are independent of each other, is aC₁₋₆ alkyl group, each of R¹¹ and R¹², which are independent of eachother, is a hydrogen atom or a C₁₋₆ alkyl group, Y is a sulfur atom, anoxygen atom, dialkylmethylene or —N(R¹³)—, and R¹³ is a hydrogen atom ora C₁₋₆ alkyl group, provided that R⁹ and R¹⁰, R⁹ and R¹¹, or R¹⁰ andR¹², may be bonded to each other to form a ring, as disclosed in EP 1148 387 A1; compounds according to formula (S-II)

wherein A represents an optionally substituted aromatic ring orheterocyclic ring, X represents an oxygen atom, a sulfur atom or—N(R¹⁶)—, R¹⁴, R¹⁵ and R¹⁶ each independently represent a hydrogen atomor a monovalent nonmetallic atom group and A and R¹⁴, or R¹⁵ and R¹⁶ canbe linked together to form an aliphatic or an aromatic ring, asdisclosed in EP 1 280 006 A2; 1,3-dihydro-1-oxo-2H-indene compounds asdisclosed in EP 1 035 435 A2; the sensitizing dyes disclosed in EP 1 048982 A1, EP 985 683 A1, EP 1 070 990 A1 and EP 1 091 247 A2; and/or anoptical brightening agent.

To achieve a very high sensitivity, an optical brightening agent as asensitizer is preferred. A typical optical brightener, also known as“fluorescent whitening agent”, is a colorless to weakly colored organiccompound that is capable of absorbing light having a wavelength in therange from about 300 nm to about 450 nm and of emitting the absorbedenergy as fluorescent light having a wavelength in the range betweenabout 400 nm and about 500 nm. A description of the physical principleand the chemistry of optical brighteners is given in Ullmann'sEncyclopedia of Industrial Chemistry, Sixth Edition, Electronic Release,Wiley-VCH 1998. Basically, suitable optical brighteners containπ-electron systems including a carbocyclic or a heterocyclic nucleus.Suitable representatives of these compounds are, e.g., stilbenes,distyrylbenzenes, distyrylbiphenyls, divinylstilbenes,triazinylaminostilbenes, stilbenzyltriazoles,stilbenzylnaphthotriazoles, bis-triazolstilbenes, benzoxazoles,bisphenylbenzoxazoles, stilbenzylbenzoxazoles, bis-benzoxazoles, furans,benzofurans, bis-benzimidazoles, diphenylpyrazolines,diphenyloxadiazoles, coumarins, naphthalimides, xanthenes, carbostyrils,pyrenes, and 1,3,5-triazinyl-derivatives.

More specifically, optical brightening agents having a structureaccording to one of the following formulae are suitable as sensitizerfor use in the composition of preferred embodiments of the presentinvention:

wherein X is one of the following groups, * denoting the position ofattachment in the above formulae:

and wherein one or more of the nuclei in each of the above formulae(S-III) to (S-XVII) may be independently substituted by one or moregroups selected from a non-metal atom group.

Especially suitable optical brighteners are compounds which are able tobe dissolved in organic solvents. The optical brighteners can be used asa single compound or as mixture of several materials. The overall amountof these compounds range from about 0.1 to about 10% by weight,preferably about 0.5 to about 8% by weight with respect to the totalweight of the non-volatile compounds in the photopolymerizablecomposition.

Highly preferred optical brighteners include compounds of formula(S-III-A) to (S-XII-A) and (S-XIV-A) to (S-XVII-A):

whereina) R¹ represents methyl, and R² to R⁵ each represent H;b) R² to R⁴ represent methoxy, and R¹ and R⁵ represent H;c) R¹ represents CN, and R² to R⁵ each represent H; ord) R³ represents CN, and R¹, R², R⁴, and R⁵ each represent H;

wherein R¹ to R⁴ each represent H, and R⁵ represents methoxy;

whereina) R¹ to R¹⁰ each represent H;b) R¹, R² and R⁴ to R¹⁰ each represent H, and R³ represents methoxy; orc) R¹, R², R⁴ to R⁷, R⁹ and R¹⁰ each represent H, and R³ and R⁸ eachrepresent methoxy;

whereina) R¹ and R³ represent H, and R² represents phenylsulfonic acid orphenylsulfonic acid salts; orb) R¹ represents H, R² represents CN and R³ represents Cl;

whereina) R¹ represents t-butyl, R² represents H and R³ represents phenyl;b) R¹ represents methyl, R² represents H, and R³ representscarboxymethyl; orc) R¹ represents H, R² represents H, and R³ represents2-(4-methyl-oxa-3,3-diazole);

whereina) X represents 4,4′-stilbenediyl, and R¹ and R² each represent H;b) X represents 2,5-thiophenediyl, and R¹ and R² each represent t-butyl;c) X represents 1,4-naphthalenediyl, and R¹ and R² each represent H; ord) X represents 1,1-ethenediyl, and R¹ and R² each represent methyl;

wherein R¹ and R² each represent diethylamino;

whereina) R¹ and R² each represent H, and R³ represents SO₂NH₂;b) R¹ and R² each represent H, and R³ representsSO₂CH₂CH₂OCH₂CH₂N(CH₃)₂;c) R¹ and R² each represent H, and R³ represents SO₂CH₂CH₂OCH(CH₃)CH₂N(CH₃)₂;d) R¹ and R² each represent H, and R³ represents SO₂CH₃; ore) R¹ and R² each represent H, and R³ represents SO₂CH₂CH₂OH;

whereina) R¹ represents H, R² represents Me, and R³ represents diethylamino;b) R¹ represents phenyl, R² represents H, and R³ represents2-N-naphthatriazolyl;c) R¹ represents H, R² represents methyl, and R³ represents OH,d) R¹ represents phenyl, R² represents H, and R³ representsNH-(4,6-dichloro)-(1,3,5)-triazine; ore) R¹ represents Ph, R² represents H, and R³ represents1-(3-methylpyrazolinyl);

whereina) R¹ represents H, R² represents methoxy, and R³ represents methyl; orb) R¹ and R² each represent OEt, and R³ represents methyl;

whereina) R¹ and R² each represent methyl, and R³ represents H; orb) R¹ and R² each represent methyl, and R³ represents carboxymethyl;

whereina) X represents 1,2-ethenediyl, and R¹ represents Me; orb) X represents 4,4′-stilbenediyl, and R¹ represents methyl;

wherein R¹ represents Ph, R² represents diethylamino, and R³ representsethyl; and

wherein R¹ and R² each represent methoxy.

From those sensitizers, the following compounds of formulae (S-III-B)and/or (S-IV-B) are particularly preferred:

whereinR¹ to R¹⁴ independently represent a hydrogen atom, an alkyl group, analkoxy group, a cyano group, or a halogen atom; and at least one of R¹to R¹⁰ represents an alkoxy group having more than 1 carbon atom;

whereinR¹⁵ to R³² independently represent a hydrogen atom, an alkyl group, analkoxy group, a cyano group, or a halogen atom; and at least one of R¹⁵to R²⁴ represents an alkoxy group having more than 1 carbon atom.

The alkyl and alkoxy groups of the preferred embodiments of the presentinvention can be optionally substituted and their substituent can beselected to adjust the solubility of the sensitizer and may be, forexample, halogen, ester, ether, thioether, or hydroxy. The alkyl oralkoxy groups may be straight chain or cyclic, but a branched chain ispreferred for the sensitizers of formulae (S-III-B) and (S-IV-B).

Particular advantages are achieved with sensitizers of formula(S-III-B), wherein R¹, R⁵, R⁶, R¹⁰, R¹¹, R¹², R¹³, and R¹⁴ independentlyrepresent a hydrogen atom, a fluorine atom, or a chlorine atom, inparticular R¹, R⁵, R⁶, and R¹⁰ being a hydrogen atom; R² to R⁴, R⁷ toR⁹, independently are alkoxy groups; and at least two of the alkoxygroups are branched and have from 3 to 15 carbon atoms. Especiallypreferred are sensitizers of formulae (S-III-B) as disclosed above,wherein R², R⁴, R⁷, R⁹ independently represent a methoxy group and R³and R⁸ independently are branched alkoxy groups having 3 to 15 carbonatoms.

Particular advantages are also achieved with sensitizers of formula(S-IV-B), wherein R¹⁵, R¹⁹, R²⁰, R²⁴, R²⁵ to R³², independentlyrepresent a hydrogen atom, a fluorine atom or a chlorine atom, inparticular R¹⁵, R¹⁹, R²⁰, R²⁴ being a hydrogen atom; R¹⁶ to R¹⁸, R²¹ toR²³, independently are alkoxy groups; and at least two of the alkoxygroups are branched and have from 3 to 15 carbon atoms. Especiallypreferred for the present invention are sensitizers of formulae (IVa) asdisclosed above, wherein R¹⁶, R¹⁸, R²¹, R²³ independently represent amethoxy group and R¹⁷ and R²² independently are branched alkoxy groupshaving 3 to 15 carbon atoms.

The following structures are examples of preferred sensitizers and theirsolubility S is given in brackets as g sensitizer/kg methyl ethyl ketonemeasured at 20° C.

The sensitizers can be synthesized by known methods and the synthesis ofthe highly preferred sensitizers of formulae (S-III-B) and (S-IV-B)preferably can be done in analogy to the synthesis of sensitizer(S-III-1) as disclosed in the following.

Synthesis of Intermediate (C-3)

To a mixture of 8.365 kg (45.0 mol) syringaldehyde (C-1) and 1.494 kg(9.0 mol) potassium iodide is added 20.25 L sulfolane at roomtemperature. After heating up this mixture to 30° C. under nitrogen,3.12 kg (47.25 mol) of KOH in water and 2.80 kg (20.25 mol) K₂CO₃ areadded. After warming the reaction mixture to 75° C., 12.78 kg (90.0 mol)2-bromo butane (C-2) is added over a period of 30 minutes. Heating at75° C. is continued for 24 hours, followed by cooling to 25° C. Then 25L Water is added and the reaction product is extracted with 18 L methylt-butyl ether (MTBE). The organic phase is consecutively a) two timeswashed with 6.0 L of a 7.5 wt. % K₂CO₃ solution in water respectively,b) two times washed with 13.5 L of pure water respectively and finally,c) two times washed with 4.5 kg of a 20 wt. % NaCl solution in waterrespectively. The solvent (MTBE) is removed by distillation underreduced pressure of 50 mBar at 75° C. and thereby are obtained 7.845 kg(theoretical yield of 75%) of the crude intermediate (C-3) as a yellowoil, that is used in the synthesis of (S-III-1) without furtherpurification.

Synthesis of Sensitizer (S-III-1)

To a mixture of 9.63 kg (25.46 mol) p-xylylene-bis-phosphonate (C-4) and12.13 kg (50.92 mol) of the crude intermediate (C-3) in 20 L THF, 4.70kg (71.3 mol) of KOH is added at room temperature. After heating thestirred reaction mixture at reflux for 3.5 hours, the reaction productis precipitated by adding a mixture of 25.2 kg methanol and 9.9 kgwater, followed by further cooling to 20° C. The crystalline product(S-III-1) is filtered off, washed with several portions ofmethanol/water on the filter and dried at 50° C. The yield is 9.05 kg(theoretical yield of 67%) of (S-III-1) having a melting point of 154°C.

A suitable synthesis for the p-xylylene-bis-phosphonate (C-4) is knownfrom the literature, e.g., from B. P. Lugovkin and B. A. Arbuzov,Doklady Akademii Nauk SSSR (1948), 59, pages 1301 to 1304.

In a preferred embodiment of the present invention, the sensitizer ispreferably a fluorene compound that is conjugated via a double or triplebond with an aromatic or heteroaromatic group.

A preferred fluorene compound sensitizer for various preferredembodiments of the present invention has at least two pi-substituentsthat together include at least a total of 16 pi-electrons that are inconjugation with the pi-electrons of the fluorene ring system. To makepossible the conjugation, the pi-substituents are bound to positions 1to 8 of the fluorene ring system. Preferably, one of the twopi-substituents is bound to position 2 and the other to position 7 ofthe fluorene ring system and each of the two pi-substituents includes atleast 8 pi-electrons that are in conjugation with the pi-electrons ofthe fluorene ring system.

The term “pi-electron” as used for the characterization of thesensitizers of various preferred embodiments of the present inventionmeans a) electrons that are localized in orbitals perpendicular to theatom-atom bonds, and b) free electron pairs. For carbon, nitrogen, andoxygen atoms pi-electrons usually are located in p-orbitals.

The terms “conjugated” or “in conjugation with” as used for thecharacterization of the sensitizers of preferred embodiments of thepresent invention, is commonly known for systems having alternatingsequences of single and multiple bonds and/or atoms with a free electronpair and multiple bonds. The pi-electrons of, e.g., two double bondsseparated by a single bond are said to be conjugated if the geometry ofthe molecule allows an overlap of the orbitals of the two double bonds,so that their four pi-electrons are delocalized. In particular, thegeometry is such that the molecular part that has a conjugated(delocalized) pi-electron system has a planar basic molecular skeleton.

The fluorene ring system and its numbering is demonstrated with thefollowing formula:

In a preferred embodiment of the present invention, the sensitizer has api-substituent including a linking group with a carbon-carbon double ortriple bond that links the fluorene ring system with an aryl orheteroaryl (hetaryl) group. The linking group can also include more thanone conjugated double bond, as long as conjugation is possible from thepi-electrons of the fluorene ring system to the aryl or heteroaryl groupof the pi-substituent. Preferably, the pi-substituent is selected fromthe groups -L-aryl or -L-heteroaryl, wherein L means an alkenylene oralkynylene group, and particularly preferred an ethenylene (vinylene) orethynylene (—CC—) group. For the pi-substituents, preferred aryl groupsare phenyl groups and preferred hetaryl groups are six ring heterocycleslike pyridinyl groups and five ring heterocycles. Examples for preferredsensitizers according to preferred embodiments of the present inventionare distyrylfluorene compounds, diheteroaryl vinylfluorene compounds,and diarylethynyl fluorene compounds.

In a particular preferred embodiment of the present invention, thesensitizer has a structure according to one of formulae (S-VIII),(S-XIX), or (S-XX):

whereinA¹ to A¹⁰, X¹ to X⁴, and Y¹, Y² mutually independent mean a substituentselected from a non-metallic atom group;L¹, L² mutually independent mean a linking group selected from —CR³═CR⁴—or ethynylene;R¹ to R⁴ mutually independent mean a substituent selected from anon-metallic atom group; andone or more pairs of the substituents can jointly mean the remainingatoms to form a ring;

whereinA¹¹ to A¹⁶ mutually independent mean a substituent selected from anon-metallic atom group;L³, L⁴ mutually independent mean a linking group selected from —CR⁷═CR⁸—or ethynylene;R⁵ to R⁸ mutually independent mean a substituent selected from anon-metallic atom group;the pyridinyl groups are unsubstituted or substituted by one to foursubstituents selected from a non-metallic atom group;L³, L⁴ are bonded to a carbon atom of the pyridyl group; and one or morepairs of the substituents can jointly mean the remaining atoms to form aring; or

whereinA¹⁷ to A²² mutually independent mean a substituent selected from anon-metallic atom group;L⁵, L⁶ mutually independent mean a linking group selected from—CR¹¹═CR¹²— or ethynylene;R⁹ to R¹² mutually independent mean a substituent selected from anon-metallic atom group;Z¹ to Z⁴ and Z⁶ to Z⁹ mutually independent mean nitrogen or carbon atomsthat can be unsubstituted or can be substituted by a substituentselected from a non-metallic atom group;Z⁵, Z¹⁰ mutually independent mean O, S, C, CR¹³, CR¹⁴R¹⁵, or NR¹⁶;R¹³ to R¹⁶ mutually independent mean a substituent selected from anon-metallic atom group; andone or more pairs of the substituents can jointly mean the remainingatoms to form a ring.

The one or more pairs of substituents that jointly can mean theremaining atoms to form a ring preferably are selected from A¹ with X¹;X¹ with Y¹; Y¹ with X²; X² with A²; A³ with X³; X³ with Y²; Y² with X⁴;X⁴ with A⁴; A⁵ with A⁶; R¹ with R²; A⁹ with A¹⁰; A¹, A², A⁶ or A⁷ withR³ or R⁴ of L¹; A³, A⁴, A⁸ or A⁹ with R³ or R⁴ of L²; A¹¹ with A¹²; A¹⁵with A¹⁶; A¹² or A¹³ with R⁷ or R⁸ of L³; A¹⁴ or A¹⁵ with R⁷ or R⁸ ofL⁴; A¹⁷ with A¹⁸; A²¹ with A²²; A¹⁸ or A¹⁹ with R¹¹ or R¹² of L⁵; andA²⁰ or A²¹ with R¹¹ or R¹² of L⁶.

In a particular preferred embodiment of the present invention, the oneor more pairs of substituents that jointly can mean the remaining atomsto from a ring are selected from R¹ with R²; A¹, A², A⁶ or A⁷ with R³ orR⁴ of L¹; A³, A⁴, A⁸ or A⁹ with R³ or R⁴ of L²; A¹² or A¹³ with R⁷ or R⁸of L³; A¹⁴ or A¹⁵ with R⁷ or R⁸ of L⁴; A¹⁸ or A¹⁹ with R¹¹ or R¹² of L⁵;and A²⁰ or A²¹ with R¹¹ or R¹² of L⁶.

In a further preferred embodiment of the present invention, thesensitizer has a structure according to one of formulae (S-XVIII),(S-XIX), or (S-XX), wherein L¹, L² mutually independent mean —CR³═CR⁴—;L³, L⁴ mutually independent mean —CR⁷═CR⁸—; and L⁵, L⁶ mutuallyindependent mean —CR¹¹═CR¹²—. In this preferred embodiment it isparticularly preferred, when R³, R⁴, R⁷, R⁸, R¹¹, and R¹² mean ahydrogen atom.

In another preferred embodiment of the present invention, the sensitizerhas a structure according to one of formulae (S-XVIII), (S-XIX) or(S-XX), wherein

A¹ to A²² mean hydrogen; and/orX¹ to X⁴ mutually independent mean a substituent selected from hydrogen,alkoxy, or alkylthio; and/orY¹, Y² mutually independent mean a substituent selected from alkoxy oralkylthio; and/orR¹, R², R⁵, R⁶, R⁹, R¹⁰ mutually independent mean straight chain orbranched alkyl; and/orL¹ to L⁶ mean —CH═CH—.

Further advantages with respect to the sensitivity can be achieved withsensitizers of the following general formulae (S-XVIII-A) and/or(S-XVIII-B):

wherein the alkyl groups mutually independent mean an unsubstitutedlinear or branched alkyl group having 1 to 20 carbon atoms andpreferably having 1 to 10 carbon atoms; X⁵ and X⁶ mutually independentmean O or S, preferably O; n, m mutually independent mean an integerfrom 1 to 3, preferably 3;

Y³, Y⁴ mutually independent mean O, S, NH, or N-alkyl, preferably O orS;R¹⁷ to R²⁰ mutually independent mean an unsubstituted linear or branchedalkyl group having 1 to 20 carbon atoms and preferably having 1 to 10carbon atoms; andthe substituents alkyl-X⁵ and alkyl-X⁶ are bound at positions 3 and/or 4and/or 5 of the phenylrings respectively. In the case where n and/or mare 1, the single substituent is preferably bound at position 4 (paraposition) of the phenyl ring concerned.

Further advantages with respect to the sensitivity can be achieved withsymmetrical sensitizers. A symmetrical sensitizer according to preferredembodiments of the present invention means a compound of formula(S-XVIII), wherein A¹=A4, A²=A³, A⁶=A⁹, A⁵=A¹⁰, A7=A⁸, X¹=X⁴, X²=X³,Y¹=Y², R¹=R², and L¹=L²; a compound of formula (S-XIX), wherein A¹¹=A¹⁶,A¹²=A¹⁵, A¹³=A¹⁴, R⁵=R⁶, L³=L⁴ and wherein the two pyridyl rings havethe same substitution; or a compound of formula (S-XX), wherein A¹⁷=A²²,A¹⁸=A²¹, A¹⁹=A²⁰, R⁹=R¹⁰, L⁵=L⁶ and wherein the two 5 ring heterocycleshave the same substitution.

Sensitizers of structures (S-XVIII) and (S-XX) are preferred over thoseof structure (S-XIX), and sensitizers of structure (S-XVIII) areparticularly preferred.

The following structures are examples of preferred sensitizers of thepresent invention:

The sensitizer can be used as a single compound or as a mixture ofcompounds of formulae (S-XVIII) and/or (S-XIX) and/or (S-XX). Theoverall amount of these compounds ranges from about 0.1 to about 10% byweight, preferably about 0.5 to about 8% by weight with respect to thetotal weight of the non-volatile compounds in the composition. Thesensitizer can also be combined with known sensitizers.

Preferred fluorene compound sensitizers useful for the present inventionhave a good solubility in common solvents. It has been found, that suchsensitizers are particularly advantageous, that have a solubility ofabout 0.5 g, in particular about 1.5 g sensitizer per 100 mLmethylethylketone or more.

The fluorene compound sensitizers can be synthesized by known methods,e.g., as described in J. M. Kauffman, G. Moyna, J. Org. Chem., 2003, 68,pp. 839-853, and particularly preferred the synthesis can be done inanalogy to the synthesis of sensitizer (S-XVIII-2) as described in thefollowing.

Synthesis of Sensitizer S-XVIII-2 Step 1: 9,9-Dipropylfluorene (2)

To a solution of fluorene (1) (41.5 g) in dimethylformamide (300 mL) at20° C. was added sodium hydride (24.7 g) in portions. The red solutionwas stirred for 2 hours at 35° C. until no more gas was evolved. To thissolution was added 1-bromopropane (62.7 g) drop-wise over 1 hour at 5°C. and then the mixture was stirred for 1 hour at 40° C.

The suspension was poured into ice-water (1.5 L) and the resultant oilwas dissolved in methylene chloride (0.5 L). The organic phase waswashed with water, dried over magnesium sulfate and the solvent wasremoved under reduced pressure. The residue was purified by vacuumdistillation (122-125° C./0.5 mmHg). After cooling, 2 was obtained as acrystalline product (47.0 g, 74%).

Step 2: 2,7-Bis(bromomethyl)-9,9-dipropylfluorene (3)

To a solution of 9,9-dipropylfluorene 2 (25.0 g) in acetic acid (50 mL)was added paraformaldehyde (paraform) (18.0 g) at 15° C. To the mixturewas then added a solution of hydrogen bromide in acetic acid (250 mL,30% w/w) over 0.5 hours, and the solution was stirred at 60° C. for 5hours. The reaction mixture was poured into ice-water (1.0 L) andstirred for 0.5 hours. The precipitate was filtered off and purified bystirring in acetonitrile (200 mL) at 40° C., filtering and drying togive 3 as a yellow powder (33 g, 77%).

Step 3: 2,7-Bis(diethylphosphofonatomethyl)-9,9-dipropylfluorene (4)

A mixture of 2,7-Bis(bromomethyl)-9,9-dipropylfluorene (3) (33.0 g) andtriethylphosphite (40 mL) was stirred for 3 hours at 150° C. Excesstriethylphosphite was removed at reduced pressure at 100° C. and theresultant oil crystallized from hexane. After drying, 4 was obtained asa white powder (31.5 g, 67.5%).

Step 4: Sensitizer S-XVIII-2

To a solution of2,7-Bis(diethylphosphofonatomethyl)-9,9-dipropylfluorene (4) (26.8 g)and 3,5-dimethoxy-4-(1-methylpropoxy)-benzaldehyde (5) (26.2 g) intetrahydrofuran (200 mL) was added potassium hydroxide (8.4 g) anddimethylsulfoxide (5.0 mL). The suspension was stirred at 70° C. for 4hours and then isopropanol (150 mL) was added. The solvent of thesupernatant solution was removed at reduced pressure and the resultantoil was stirred in methanol (200 mL). The precipitate was filtered offand purified by stirring in boiling ethanol (200 mL) two times. Afterdrying, S-XVIII-2 was obtained as a yellow powder (25.8 g, 72%).

The known photopolymerization initiators can be used in the compositionof preferred embodiments of the present invention, but as disclosedabove, in a preferred embodiment of the present invention, thephotopolymerizable composition can include a hexaaryl-bisimidazole(HABI; dimer of triaryl-imidazole) compound as a photopolymerizationinitiator alone or in combination with further photoinitiators.

A procedure for the preparation of hexaarylbisimidazoles is described inDE 1470 154 and their use in photopolymerizable compositions isdocumented in EP 24 629, EP 107 792, U.S. Pat. No. 4,410,621, EP 215 453and DE 3 211 312. Preferred derivatives are e.g.2,4,5,2′,4′,5′-hexaphenylbisimidazole,2,2′-bis(2-chlorophenyl)-4,5,4′,5′-tetraphenylbisimidazole,2,2′-bis(2-bromophenyl)-4,5,4′,5′-tetraphenylbisimidazole,2,2′-bis(2,4-dichlorophenyl)-4,5,4′,5′-tetraphenylbisimidazole,2,2′-bis(2-chlorophenyl)-4,5,4′,5′-tetrakis(3-methoxyphenyl)bisimidazole,2,2′-bis(2-chlorophenyl)-4,5,4′,5′-tetrakis(3,4,5-trimethoxyphenyl)-bisimidazole,2,5,2′,5′-tetrakis(2-chlorophenyl)-4,4′-bis(3,4-dimethoxyphenyl)bisimidazole,2,2′-bis(2,6-dichlorophenyl)-4,5,4′,5′-tetraphenylbisimidazole,2,2′-bis(2-nitrophenyl)-4,5,4′,5′-tetraphenylbisimidazole,2,2′-di-o-tolyl-4,5,4′,5′-tetraphenylbisimidazole,2,2′-bis(2-ethoxyphenyl)-4,5,4′,5′-tetraphenylbisimidazole and2,2′-bis(2,6-difluorophenyl)-4,5,4′,5′-tetraphenylbisimidazole. Theamount of the HABI photoinitiator typically ranges from about 0.01 toabout 30% by weight, preferably from about 0.5 to about 20% by weight,relative to the total weight of the non volatile components of thephotopolymerizable composition.

A very high sensitivity can be obtained by the combination of an opticalbrightener as a sensitizer and a hexaarylbisimidazole as photoinitiator,sensitizers of formulae (S-III) and (S-IV) being particularly preferred.

Suitable classes of photoinitiators other than hexaarylbisimidazolecompounds include aromatic ketones, aromatic onium salts, organicperoxides, thio compounds, ketooxime ester compounds, borate compounds,azinium compounds, metallocene compounds, active ester compounds andcompounds having a carbon-halogen bond, but preferably the compositionincludes a non-boron including photopolymerization initiator, andparticularly preferred the photopolymerization initiator includes noboron compound. Many specific examples of photoinitiators suitable forpreferred embodiments of the present invention can be found in EP-A 1091 247.

Preferably hexaarylbisimidazole compounds and/or metallocene compoundsare used alone or in combination with other suitable photoinitiators, inparticular with aromatic ketones, aromatic onium salts, organicperoxides, thio compounds, ketoxime ester compounds, azinium compounds,active ester compounds or compounds having a carbon halogen bond.

In a preferred embodiment of the present invention, thehexaarylbisimidazole compounds include more than about 50 mol %,preferably at least about 80 mol %, and more preferably at least about90 mol % of all of the photoinitiators used in the photopolymerizablecomposition.

The non-metallic atom group preferably consists of a hydrogen atom oralkyl, alkenyl, alkynyl, aryl, heterocyclyl, hydroxy, carboxy,carbalkoxy, halogeno, alkoxy, aryloxy, heterocyclyloxy, alkylthio,arylthio, heterocyclylthio, alkylseleno, arylseleno, heterocyclylseleno,acyl, acyloxy, alkylsulfonyl, aminosulfonyl, acylamino, cyano, nitro,amino or mercapto groups, wherein heterocycle means a saturated,unsaturated or aromatic heterocycle and acyl means the remaining residueof an aliphatic, olefinic or aromatic carbon, carbaminic, sulfonic,amidosulfonic or phosphonic acid.

In a preferred embodiment of the present invention, the non-metallicatom group consists of a hydrogen atom or alkyl, alkenyl, aryl,heterocyclyl, hydroxy, carboxy, carbalkoxy, halogeno, alkoxy, aryloxy,heterocyclyloxy, alkylthio, arylthio, heterocyclylthio, acyl, acyloxy,acylamino, cyano, nitro, amino, or mercapto groups, wherein heterocyclehas the same meaning as given above and acyl means the remaining residueof an aliphatic, olefinic or aromatic carbon, sulfonic, amidosulfonic orphosphonic acid.

Alkyl, alkylene, alkenyl, alkenylene, alkynyl and alkynylene groupsaccording to preferred embodiments of the present invention can belinear (straight chain), branched, or cyclic.

The alkyl, alkylene, alkenyl, alkenylene, alkynyl, alkynylene, aryl,heterocyclyl, alkoxy, and alkylthio groups of the preferred embodimentsof the present invention can be optionally substituted by a substituentselected from the non-metallic atom group and the substituents can beselected to adjust the solubility of the sensitizer and preferably maybe halogeno, alkoxy, alkylthio, carbalkoxy, acyloxy, or hydroxy.

A ring according to the preferred embodiments of the present inventionmeans a carbo- or heterocyle, that can be substituted by substituentsselected from, e.g., the non-metallic atom group, that can be saturated,unsaturated, or aromatic and that itself can be substituted by furtherrings. Preferably, the ring is a 5 to 8 membered ring, and in particulara 5 or 6 membered ring.

The binder can be selected from a wide series of organic polymers.Compositions of different binders can also be used. Useful bindersinclude for example chlorinated polyalkylenes in particular chlorinatedpolyethylene and chlorinated polypropylene; poly(methacrylic acid) alkylesters or alkenyl esters in particular poly(methyl (meth)acrylate),poly(ethyl (meth)acrylate), poly(butyl (meth)acrylate), poly(isobutyl(meth)acrylate), poly(hexyl (meth)acrylate), poly((2-ethylhexyl)(meth)acrylate) and poly(alkyl (meth)acrylate); copolymers of(meth)acrylic acid alkyl esters or alkenyl esters with othercopolymerizable monomers, in particular with (meth)acrylonitrile, vinylchloride, vinylidene chloride, styrene and/or butadiene; poly(vinylchloride) (PVC); vinylchloride/(meth)acrylonitrile copolymers;poly(vinylidene chloride) (PVDC); vinylidenechloride/(meth)acrylonitrile copolymers; poly(vinyl acetate); poly(vinylalcohol); poly (meth)acrylonitrile; (meth)acrylonitrile/styrenecopolymers; (meth) acrylamide/alkyl (meth)acrylate copolymers;(meth)acrylonitrile/butadiene/styrene (ABS) terpolymers; polystyrene;poly(α-methylstyrene); polyamides; polyurethanes; polyesters; celluloseor cellulose compounds like methyl cellulose, ethyl cellulose, acetylcellulose, hydroxy-(C₁₋₄-alkyl)cellulose, carboxymethyl cellulose;poly(vinyl formal) and poly(vinyl butyral). Particularly suitable arebinders that are insoluble in water, but on the other hand are solubleor at least swellable in aqueous-alkaline solutions. Further effectivebinders are polymers that are soluble in common organic coatingsolvents.

Particularly suitable are binders containing carboxyl groups, inparticular polymers or copolymers containing monomeric units ofα,β-unsaturated carboxylic acids and/or monomeric units ofα,β-unsaturated dicarboxylic acids, preferably acrylic acid, methacrylicacid, crotonic acid, vinylacetic acid, maleic acid, or itaconic acid. Bythe term “copolymers” are to be understood in the context of the presentinvention polymers containing units of at least 2 different monomers,thus also terpolymers and higher mixed polymers. Particularly usefulexamples of copolymers are those containing units of (meth)acrylic acidand units of alkyl (meth)acrylates, allyl (meth)acrylates and/or(meth)acrylonitrile as well as copolymers containing units of crotonicacid and units of alkyl (meth)acrylates and/or (meth)acrylonitrile andvinylacetic acid/alkyl (meth)acrylate copolymers. Also suitable arecopolymers containing units of maleic anhydride or maleic acid monoalkylesters. Among those are, for example, copolymers containing units ofmaleic anhydride and styrene, unsaturated ethers or esters orunsaturated aliphatic hydrocarbons and the esterification productsobtained from such copolymers. Further suitable binders are productsobtainable from the conversion of hydroxyl-containing polymers withintramolecular dicarboxylic anhydrides. Further useful binders arepolymers in which groups with acid hydrogen atoms are present, some orall of which are converted with activated isocyanates. Examples of thesepolymers are products obtained by conversion of hydroxyl containingpolymers with aliphatic or aromatic sulfonyl isocyanates or phosphinicacid isocyanates. Also suitable are polymers with aliphatic or aromatichydroxyl groups, for example copolymers containing units of hydroxyalkyl(meth)acrylates, allyl alcohol, hydroxystyrene or vinyl alcohol, as wellas epoxy resins, provided they carry a sufficient number of free OHgroups.

The organic polymers used as binders have a typical mean molecularweight M_(w) between about 600 and about 200,000, preferably betweenabout 1,000 and about 100,000. Preference is further given to polymershaving an acid number between about 10 to about 250, preferably about 20to about 200, or a hydroxyl number between 50 and 750, preferablybetween 100 and 500. The amount of binder(s) generally ranges from about10 to about 90% by weight, preferably about 20 to about 80% by weight,relative to the total weight of the non-volatile components of thecomposition.

The polymerizable compound can be selected from a wide series ofphoto-oxidizable compounds, in particular, from those that include atleast one of the following N-containing groups: primary, secondary, ortertiary amino, urethane, or urea. From the compounds including at leastone primary, secondary, or tertiary amino group, those including atleast a tertiary amino group are preferred. Radically polymerizablecompounds containing at least one urethane and/or urea group and/or atertiary amino group are particularly preferred. By the term “ureagroup” is to be understood in the context of preferred embodiments ofthe present invention a group of the formula >N—CO—N<, wherein thevalences on the nitrogen atoms are saturated by hydrogen atoms andhydrocarbon radicals (with the proviso that not more than one valence oneither of the two nitrogen atoms is saturated by one hydrogen atom).However, it is also possible for one valence on one nitrogen atom to bebonded to a carbamoyl (—CO—NH—) group, producing a biuret structure.

Also suitable are compounds containing a photo-oxidizable amino, urea orthio group, which may be also be a constituent of a heterocyclic ring.Compounds containing photo-oxidizable enol groups can also be used.Specific examples of photo-oxidizable groups are triethanolamino,triphenylamino, thiourea, imidazole, oxazole, thiazole, acetylacetonyl,N-phenylglycine, and ascorbic acid groups. Particularly suitablecompounds are monomers containing photo-oxidizable groups correspondingto the following formula (XVIII):

R_((m-n))Q[(—CH₂—CR¹R²—O)_(a)—CO—NH—(X¹—NH—CO—O)_(b)—X²—(O—CO—CR³═CH₂)_(c)]_(n)  (XVIII)

wherein

-   R represents an alkyl group having 2 to 8 carbon atoms ((C₂-C₈)    alkyl group), a (C₂-C₈) hydroxyalkyl group, or a (C₆-C₁₄) aryl    group;-   Q represents —S—,

wherein

-   -   E represents a divalent saturated hydrocarbon group of 2 to 12        carbon atoms, a divalent 5- to 7-membered, saturated iso- or        heterocyclic group, which may contain up to 2 nitrogen, oxygen        and/or sulfur atoms in the ring, a divalent aromatic mono- or        bicyclic isocyclic group of 6 to 12 carbon atoms or a divalent        5- or 6-membered aromatic heterocyclic group; and    -   D¹ and D² independently represent a saturated hydrocarbon group        of 1 to 5 carbon atoms;

-   R¹ and R² independently represent a hydrogen atom, an alkyl, or    alkoxyalkyl group;

-   R³ represents a hydrogen atom, a methyl, or ethyl group;

-   X¹ represents a straight-chained or branched saturated hydrocarbon    group of 1 to 12 carbon atoms;

-   X² represents a (c+1)-valent hydrocarbon group in which up to 5    methylene groups may have been replaced by oxygen atoms;

-   a is an integer from 0 to 4;

-   b is 0 or 1;

-   c is an integer from 1 to 3;

-   m is an integer from 2 to 4; and

-   n is an integer from 1 to m.

Compounds of this nature and processes for their preparation aredescribed in EP 287 818. If a compound of general formula (XVIII)contains several radicals R or several radicals according to thestructure indicated between square brackets, i.e., if (n−m)>1 and n>1,these radicals can be identical or different from one another. Compoundsaccording to formula (XVIII) wherein n=m are particularly preferred. Inthis case, all radicals contain polymerizable groups.

Preferably, the index a is 1; if several radicals are present, a cannotbe 0 in more than one radical. If R is an alkyl or hydroxyalkyl group, Rgenerally contains 2 to 6, particularly 2 to 4 carbon atoms. Arylradicals R are in general mononuclear or binuclear, preferably howevermononuclear, and may be substituted with (C₁-C₅) alkyl or (C₁-C₅) alkoxygroups. If R¹ and R² are alkyl or alkoxy groups, they preferably contain1 to 5 carbon atoms. R³ is preferably a hydrogen atom or a methyl group.X¹ is preferably a straight-chained or branched aliphatic and/orcycloaliphatic radical of preferably 4 to 10 carbon atoms. In apreferred embodiment, X² contains 2 to 15 carbon atoms and is, inparticular, a saturated, straight-chained, or branched aliphatic and/orcycloaliphatic radical containing this amount of carbon atoms. Up to 5methylene groups in these radicals may have been replaced by oxygenatoms; in the case of X² being composed of pure carbon chains, theradical generally has 2 to 12 carbon atoms, preferably 2 to 6 carbonatoms. X² can also be a cycloaliphatic group of 5 to 10 carbon atoms, inparticular a cyclohexane diyl group. The saturated heterocyclic ringformed by D¹, D² and both nitrogen atoms generally has 5 to 10 ringmembers in particular 6 ring members. In the latter case theheterocyclic ring is preferably a piperazine and the radical derivedtherefrom a piperazine-1,4-diyl radical. In a preferred embodiment,radical E is an alkane diyl group which normally contains about 2 to 6carbon atoms. Preferably the divalent 5- to 7-membered, saturated,isocyclic group E is a cyclohexane diyl group, in particular acyclohexane-1,4-diyl group. The divalent, isocyclic, aromatic group E ispreferably an ortho-, meta- or para-phenylene group. The divalent 5- or6-membered aromatic heterocyclic group E, finally, contains preferablynitrogen and/or sulfur atoms in the heterocyclic ring. c is preferably1, i.e., each radical in the square bracket generally contains only onepolymerizable group, in particular only one (meth) acryloyloxy-group.

The compounds of formula (XVIII) wherein b=1, which accordingly containtwo urethane groups in each of the radicals indicated in the squarebrackets, can be produced in a known way by conversion of acrylic estersor alkacrylic esters which contain free hydroxyl groups with equimolaramounts of diisocyanates. Excess isocyanate groups are then, forexample, reacted with tris(hydroxyalkyl)amines,N,N′-bis(hydroxyalkyl)piperazines orN,N,N′,N′-tetrakis(hydroxyalkyl)alkylenediamines, in each of whichindividual hydroxyalkyl groups may have been replaced by alkyl or arylgroups R. If a=0, the result is a urea grouping. Examples of thehydroxyalkylamine starting materials are diethanolamine,triethanolamine, tris(2-hydroxypropyl)amine, tris(2-hydroxybutyl)amineand alkyl-bis-hydroxyalkylamines. Examples of suitable diisocyanates arehexamethylene diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate,1,4-cyclohexylene diisocyanate (=1,4-diisocyanatocyclohexane), and1,1,3-trimethyl-3-isocyanatomethyl-5-isocyanatocyclohexane. Thehydroxy-containing esters used are preferably hydroxyethyl(meth)acrylate, hydroxypropyl (meth)acrylate, and hydroxyisopropyl(meth)acrylate.

The polymerizable compounds of formula (XVIII) wherein b=0 are preparedconverting the above-described hydroxyalkylamino compounds withisocyanate-containing acrylic or alkacrylic esters. A preferredisocyanate-containing ester is isocyanoto-ethyl (meth)acrylate.

Further polymerizable compounds including photooxidizable groupssuitable are compounds according to the following formula (XIX):

R_((m-n))Q[(—CH₂—CR¹R²—O_(a′)—(CH₂—CH[CH₂—O—CO—CR³═CH₂]—O)_(b′)—H]_(n)  (XIX)

wherein a′ and b′ independently represent integers from 1 to 4; Q, R¹,R², R³, n and m have the same meaning as above; and Q can also be agroup of the formula >N-E′-N< wherein the radical E′ corresponds to thefollowing formula (XX):

—CH₂—CH(OH)—CH₂—[O—(p)C₆H₄—C(CH₃)₂—(p)C₆H₄—CH₂—CH(OH)—CH₂—]_(c)  (XX)

wherein c has the same meaning as in formula (I) and (p)C₆H₄ representspara-phenylene.

The compounds of formula (XIX) can be prepared analogously to those offormula (XVIII), except that the conversion products of hydroxyalkylacrylates or alkacrylates and diisocyanates are replaced by thecorresponding acrylic and alkacrylic glycide esters. Compounds offormula (XX) and processes to their preparation are disclosed in EP 316706.

Further useful polymerizable compounds containing photooxidizable groupsare acrylic and alkacrylic esters of the following formula (XXI):

Q′[(—X^(1′)—CH₂—O)_(a)—CO—NH(—X¹—NH—CO—O)_(b)—X²—O—CO—CR³═CH₂]_(n)  (XXI)

whereinQ′ represents

wherein D¹ and D² independently represent a saturated hydrocarbon groupof 1 to 5 carbon atoms and D³ represents a saturated hydrocarbon groupof 4 to 8 carbon atoms, which together with the nitrogen atom forms a 5-or 6-membered heterocyclic ring; X^(1′) represents —C_(i)H_(2i)— or

Z represents a hydrogen atom or a radical of the following formula:

—C_(k)H_(2k)—O—CO—NH(—X¹—NH—CO—O)_(b)—X²—O—CO—CR³═CH₂;

i, k independently represent integers from 1 to 12;n′ represents an integer from 1 to 3; anda is 0 or 1; provided that a is 0 in at least one of the radicals bondedto Q;X¹, R³, a, and b have the same meaning as given in the above formula(VIII); andX² represents a divalent hydrocarbon group in which up to 5 methylenegroups may be replaced by oxygen atoms.

In formula (XXI) index a is preferably 0 or 1 and i preferablyrepresents a number between 2 and 10. Preferred radicals Q arepiperazine-1,4-diyl (D¹=D²=CH₂—CR₂), piperidine-1-yl (D³=(CH₂)₅, Z=H),and 2-(2-hydroxyethyl)-piperidine-1-yl (D³=(CH₂)₅, Z=CH₂CH₂OH).

Of the compounds of formula (XXI), those which apart from a urea groupcontain at least one urethane group are preferred. Here again, by theterm “urea group” is to be understood the group offormula >N—CO—N<already mentioned above. Compounds of formula (XXI) andprocesses for their preparation are disclosed in EP 355 387.

Also suitable polymerizable compounds are reaction products of mono- ordiisocyanates with multifunctional alcohols, in which the hydroxy groupsare partly or completely esterified with (meth)acrylic acid. Preferredcompounds are materials, which are synthesized by the reaction ofhydroxyalkyl-(meth)acrylates with diisocyanates. Such compounds arebasically known and are, for instance, described in DE 28 22 190 and DE20 64 079.

The amount of polymerizable compound including photooxidizable groupsgenerally ranges from about 5% to about 75% by weight, preferably fromabout 10% to about 65% by weight, relative to the total weight of thenon volatile compounds of the photopolymerizable composition.

Moreover, the composition can contain polyfunctional (meth)acrylate oralkyl(meth)acrylate compounds as crosslinking agents. Such compoundscontain more than 2, preferably between 3 and 6 (meth)acrylate and/oralkyl(meth)acrylate groups and include in particular (meth)acrylates ofsaturated aliphatic or alicyclic trivalent or polyvalent alcohols suchas trimethylol ethane, trimethylol propane, pentaerythritol ordipentaerythritol.

The total amount of polymerizable compounds generally ranges from about10% to about 90% by weight, preferably from about 20% to about 80% byweight, relative to the total weight of the non volatile components ofthe photopolymerizable composition.

The following specific example is a preferred polymerizable compound:

It can be useful to combine the polythiol compounds with known sulfurcontaining compounds such as those described in EP 107 792, inparticular with thiols like, e.g., 2-mercaptobenzothiazole,2-mercaptobenzoxazole, or 2-mercapto-benzimidazole. The amount of suchadditional sulfur containing compounds generally ranges from about 0.01%to about 10% by weight, preferably from about 0.1% to about 2% byweight, relative to the total weight of the non volatile components ofthe photopolymerizable composition.

Optionally, pigments, e.g., predispersed phthalocyanine pigments, can beadded to the composition for dyeing the composition and the layersproduced therewith. Their amount generally ranges from about 1% to about20% by weight, preferably from about 2% to about 15% by weight andparticularly preferred from about 2% to about 10% by weight related tothe total weight of the non volatile components of the composition.Particularly suitable predispersed phthalocyanine pigments are disclosedin DE 199 15 717 and DE 199 33 139. Preference is given to metal-freephthalocyanine pigments.

In order to adjust the photopolymerizable composition to specific needs,thermal inhibitors or stabilizers for preventing thermal polymerizationmay be added. Furthermore, additional hydrogen donors, dyes, colored orcolorless pigments, color formers, indicators, and plasticizers may bepresent. These additives are conveniently selected so that they absorbas little as possible in the actinic range of the imagewise appliedradiation.

In a preferred embodiment of the present invention, the composition isphotopolymerizable upon absorption of light in the wavelength range fromabout 300 nm to about 600 nm, preferably about 350 nm to about 430 nm,in particular from about 380 nm to about 430 nm, and particularlypreferred from about 390 nm to about 420 nm.

The present invention also relates to a photopolymer printing plateprecursor including the photopolymerizable composition on a support, inparticular a photopolymer printing plate precursor including, in thisorder, the photopolymerizable composition and a protective coating on asupport.

In a preferred embodiment of the present invention, the protective layerhas a dry coating weight of less than about 2.0 g/m².

The photopolymerizable composition may be applied to the support byprocesses which are known per se to the person skilled in the art. Ingeneral, the components of the photopolymerizable composition aredissolved or dispersed in an organic solvent or solvent mixture, thesolution or dispersion is applied to the intended support by pouring on,spraying on, immersion, roll application or in a similar process and thesolvents are removed during the subsequent drying.

The known supports can be used for the photopolymer printing plate,like, e.g., foils, tapes or plates made of metal or plastics and in thecase of screen-printing also of Perlon gauze. Preferred metals arealuminum, aluminum alloys, steel and zinc, aluminum and aluminum alloysbeing particularly preferred. Preferred plastics are polyester andcellulose acetates, polyethyleneterephthalate (PET) being particularlypreferred.

In most cases, it is preferable to treat the surface of the supportmechanically and/or chemically and/or electrochemically to optimallyadjust the adherence between the support and the photosensitive coatingand/or to reduce the reflection of the imagewise exposed radiation onthe surface of the support (annihilation).

The most preferred support to be used is made of aluminum or an aluminumalloy, its surface is electrochemically roughened, thereafter anodizedand optionally treated with a hydrophilizing agent like, e.g.,poly(vinylphosphonic acid).

The protective overcoat preferably includes at least one type ofpoly(vinyl alcohol), in particular a poly(vinyl alcohol) wherein themean degree of saponification is less than about 93 mol %.

The degree of saponification is related to the production of poly(vinylalcohols). As the monomer of poly(vinyl alcohol), vinyl alcohol, isnonexistent, only indirect methods are available for the production ofpoly(vinyl alcohol). The most important manufacturing process forpoly(vinyl alcohol) is the polymerization of vinyl esters or ethers,with subsequent saponification or transesterification. The preferredstarting material for the poly (vinyl alcohol) is a vinyl alcoholesterified by a mono carboxylic acid and in particular vinyl acetate,but derivatives of vinyl acetate, vinyl esters of di carboxylic acids,vinyl ethers and the like can also be used. The degree of saponificationas defined in the present invention is the molar degree of hydrolysisirrespective of the process used for the hydrolysis. Pure poly(vinylalcohol) has, e.g., a degree of saponification of 100 mol %, butcommercial products often have a degree of saponification of 98 mol %.The poly(vinyl alcohols) may contain mainly 1,3-diol units, but may alsocontain small amounts of 1,2-diol units. In the partially saponifiedpoly(vinyl alcohols) the ester or the ether group can be distributedstatistically or blockwise. Preferred partially saponified poly(vinylalcohols) have a viscosity of about 4% aqueous solution at approximately20° C. of about 4 to about 60 mPa·s, preferably of about 4 to about 20mPa·s, and in particular of about 4 to about 10 mPa·s.

Poly(vinyl alcohols) preferred for the present invention arecommercially available, e.g., under the tradename Mowiol. Those productsare characterized by two appended numbers, meaning the viscosity and thedegree of saponification. For example, Mowiol 8-88 or Mowiol 8/88 mean apoly(vinyl alcohol) having an approximately 4% aqueous solution at about20° C. a viscosity of ca 8 mPa·s and a degree of saponification of about88 mol %. Although the use of only one type of poly(vinyl alcohol) issufficient to achieve an advantage of various preferred embodiments ofthe present invention, it is preferred to use a mixture of two or morecompounds, because this allows a more accurate adjustment and a betteroptimization of further properties of the printing plate precursor.Preferably, poly(vinyl alcohols) differing in viscosity as defined aboveand/or in saponification degree are combined. Particularly preferred aremixture of poly(vinyl alcohols) that differ in viscosity of their 4%aqueous solutions at about 20° C. for at least about 2 mPa·s or thatdiffer in saponification degree for at least about 5 mol %. Mostpreferred are mixtures including at least 3 types of poly(vinylalcohols), wherein at least two compounds differ in viscosity as definedabove for at least about 2 mPa·s and at least two compounds differ insaponification degree for at least about 5 mol %.

According to a preferred embodiment of the present invention, theoverall mean saponification degree of all poly(vinyl alcohols) used inthe protective layer is preferably less than about 93 mol %. In aparticular preferred embodiment of the present invention, the overallmean saponification degree ranges from about 71 mol % to less than about93 mol %, and in particular from about 80 mol % to about 92.9 mol %.

As long as the mean overall saponification limit of about 93 mol % isnot reached, one of the poly(vinyl alcohols) used in a mixture can havea mean saponification degree of more than 93 mol % and even up to 100mol %.

The overall mean saponification degree of the poly(vinyl alcohols) usedin the protective overcoat of a printing plate precursor can bedetermined experimentally via ¹³C-NMR. To measure the ¹³C-NMR spectra,approximately 200 mg of the protective overcoat are dissolved in 1.0 mlDMSO and from this solution a 75 MHz ¹³C-NMR spectrum is taken, whoseresonances can easily be interpreted and allow to calculate the degreeof saponification. Such values are listed in the Examples, in Table 3,as experimental values. A good correlation is obtained between theexperimental values and the values known from the product specificationof the poly(vinyl alcohols). The latter values are hereinafter calledtheoretical values of the mean saponification degree and can easily becalculated, when a mixture of poly(vinyl alcohols) are used.

Preferably, poly(vinyl alcohol)s are used in about 50 to about 99.9weight percent (wt. %) relative to the total weight of the non-volatilecompounds of the protective overcoat.

Apart from poly(vinyl alcohol)s other water soluble polymers can beadded to the layer such as poly(vinyl pyrrolidone), poly(ethyleneoxide), gelatin, gum arabic, oxygen binding polymers with aliphaticamine groups known from EP 352 630 B1, methyl vinylether/maleicanhydride copolymers, poly(carboxylic acids), copolymers of ethyleneoxide and poly(vinyl alcohol), carbon hydrates, hydroxy ethyl cellulose,acidic cellulose, cellulose, poly(arylic acid) and mixtures of thesepolymers.

Preferably the poly(vinyl pyrrolidone) is only used in small quantitiescompared to the poly(vinyl alcohol). In a preferred embodiment of thepresent invention poly(vinyl pyrrolidone) is used from 0 to about 10parts by weight of the poly(vinyl alcohol) used, from 0 to about 3 partsby weight being particularly preferred. Most preferred, no poly(vinylpyrrolidone) compounds are used.

In addition to the poly(vinyl alcohol) and the optional watersolublepolymers disclosed above, the known ingredients of protective layers canbe used.

Examples of known ingredients suitable for the protective layer aresurface wetting agents, coloring agents, complexants, polyethylenimines,and biocides.

The protective layer has to be transparent for actinic light. Preferablyit is homogeneous, substantially impermeable to oxygen, waterpermeable,and can be washed off preferably with the conventional developersolutions used to form a printing relief after imagewise exposure of thephotosensitive layer. The photosensitive layer is removed imagewise,whereas the protective layer is removable over the entire area of theelement created. The wash-off of the protective layer can be done in aseparate step, but can be done during the development step as well.

The dry coating weight of the protective overcoat can be measured by thefollowing procedure. A plate is exposed for 4 hours to daylight. Next,the plate is pre-heated between about 104° C. and about 127° C.(temperature measured via a thermostrip (THERMAX commercially availablefrom TMC) at the back of the plate). The plate is cut to a size ofapproximately 100 mm×100 mm and weighted on an analytical balance withabout 0.01 mg accuracy (=Weight A). Next the protective overcoat iswashed off with water (about 25° C.) for about 2 minutes. Than the plateis rinsed with demineralized water and dried in an oven at about 100° C.After drying the plate is allowed to cool down to room temperature, andthe weight is determined using the same analytical balance as describedearlier (=Weight B). The dry coating weight in g/m² of the protectiveovercoat is calculated using the formula below:

Dry coating weight (g/m²)=100×(Weight A−Weight B)

The protective layer can be coated on the photosensitive layer withknown techniques and the coating solution preferably contains water or amixture of water and an organic solvent. To allow a better wetting, thecoating solution preferably contains, related to the solid content, upto about 10 wt. %, and particularly preferred up to about 5 wt. % of asurface active agent. Suitable representatives of surface active agentsinclude anionic, cationic, and nonionic surface active agents likesodium alkylsulfates and -sulfonates having 12 to 18 carbon atoms, anexample of which is sodium dodecylsulfate, N-cetyl- and C-cetyl betaine,alkylaminocarboxylate and -dicarboxylate, and polyethylene glycols witha mean molar weight up to 400.

In addition, further functions can be added to the protective layer. Forexample, it can be possible to improve the safelight suitability withoutdecreasing the sensitivity of the layer by adding a coloring agent,e.g., a water-soluble dye, that has excellent transmission to the lighthaving a wavelength of about 300 nm to about 450 nm and that absorbs thelight having a wavelength of about 500 nm or more. This principle caneasily be varied for different wavelengths to adjust the effectivespectral sensitivity distribution of the printing plate precursor asneeded.

The present invention also relates to a method of making a lithographicprinting plate including the steps of providing a photopolymer printingplate of a preferred embodiment of the present invention, exposing theprinting plate precursor with a laser, preferably with a laser having anemission wavelength in the range from about 300 nm to about 600 nm, inparticular from about 300 nm to 450 nm, heating the plate to atemperature, when measured at the back of the plate, of about 90° C. toabout 150° C., for a time between about 10 seconds and about 1 minute,washing off the protective coating, and processing the printing plateprecursor in an aqueous alkaline developer.

In a preferred embodiment of the process of the present invention theexposure is done with a laser having an emission wavelength in the rangefrom about 380 nm to about 430 nm, in particular in the range from about390 nm to about 420 nm, and the exposure is carried out at an energydensity, measured on the surface of the plate of about 100 μJ/cm² orless.

The processing of the printing plate precursor may be done in the usualmanner. After image-wise exposure a pre-heat step is performed toimprove the crosslinking of the photosensitive layer. Usually thepre-heat step is then followed by the development step, wherein thecomplete overcoat layer and the unexposed portions of the photosensitivelayer are removed. The removal (wash-off) of the overcoat layer and thedevelopment of the photosensitive layer can be done in two separatesteps in this order, but can also be done in one step simultaneously.Preferably, the overcoat layer is washed-off with water before thedevelopment step. The wash-off can be done with cold water, but it ispreferred to use hot water to accelerate the process. What remains onthe support after the development step are the exposed and therebyphotopolymerized portions of the photosensitive layer. The developersolution used for the development of the exposed printing plateprecursors is preferably an aqueous alkaline solution having a pH of atleast 11, a pH from 11.5 to 13.5 being particularly preferred. Thedeveloper solution can contain a small percentage, preferably less thanabout 5 wt. %, of an organic, water-miscible solvent. To adjust the pHof the solution, an alkali hydroxide is preferably used.

Examples of preferred, additional ingredients of the developer solutioninclude alone or in combination alkali phosphates, alkali carbonates,alkali bicarbonates, an organic amine compound, alkali silicates,buffering agents, complexants, defoamers, surface active agents, anddyes, but the suitable ingredients are not limited to the preferredexamples and further ingredients can be used.

The method of development employed is not particularly limited, and maybe conducted by soaking and shaking the plate in a developer, physicallyremoving non-image portions while being dissolved in a developer bymeans of, e.g., a brush, or spraying a developer onto the plate so as toremove non-image portions. The time for development is selecteddepending upon the above method used so that the non-image portions canadequately by removed, and is optionally selected within a range ofabout 5 seconds to about 10 minutes.

After the development, the plate may be subjected to a hydrophilictreatment by means of, e.g., gum arabic optionally applied to theprinting plate as the case requires (gumming step).

Examples A. Preparation (Coating) of the Photosensitive Layer

A composition was prepared (pw=parts per weight; wt. %=weightpercentage) by mixing the components as specified in Table 1. Acomposition such as this was divided equally into portions of 26.21 g,and to each portion was added an amount of co-initiator according toTable 2. The resulting composition was coated on an electrochemicallyroughened and anodically oxidized aluminum sheet, the surface of whichhas been rendered hydrophilic by treatment with an aqueous solution ofpolyvinyl phosphonic acid (oxide weight 3 g/m²) and was dried for 1minute at 120° C. (circulation oven). The resulting thickness of thelayer was 1.5 g/m².

For each composition (experiment), two coatings were made.

TABLE 1 Parts per weight Component (g) a solution containing 32.4 wt. %of a methacrylate/ 16.075 methacrylic acid copolymer (ratiomethylmethacrylate:methacrylic acid of 4:1 by weight; acid number: 110mg KOH/g) in 2-butanone (viscosity 105 mm²/s at 25° C.). a solutioncontaining 88.2 wt. % of a reaction 14.538 product from 1 mole of2,2,4-trimethyl- hexamethylenediisocyanate and 2 moles of hydroxy-ethylmethacrylate (viscosity 3.30 mm²/s at 25° C.) Heliogene blue D7490 ® dispersion (9.9 wt. %, 17.900 viscosity 7.0 mm²/s at 25° C.),trade name of BASF AG2,2′-bis(2-chlorophenyl)-4,4′,5,5′-tetraphenyl-1,2- 1.448 bisimidazole1,4-di[3,5-dimethoxy-4-(1- 0.958 methylpropoxy)styryl]benzene Edaplan LA411 ® (1% in Dowanol PM ®, trade mark of 2.250 Dow Chemical Company)2-butanone 78.538 propyleneglycol-monomethylether (Dowanol PM ®, trade130.358 mark of Dow Chemical Company)

TABLE 2 Amount Co- Amount Co- Co- initiator initiator Example Experimentinitiator (g) (mmol) 1 A TH-1 0.0010 0.00598 1 B TH-1 0.0020 0.0120 1 CTH-1 0.0040 0.0239 1 D TH-1 0.0068 0.0407 1 E TH-1 0.0100 0.0598 1 FTH-1 0.0150 0.0897 1 G TH-1 0.0300 0.179 1 H TH-1 0.0500 0.299 1 I TH-10.1000 0.598 1 J IV-1 0.0862 0.642 (monomer units) 1 K IV-1 0.0431 0.321(monomer units) 2 L TH-1 0.0068 0.0407 2 M III-1 0.0796 0.284 2 N TH-30.0796 0.452 2 O TH-2 0.0061 0.0403 2 P TH-2 0.0068 0.0450 2 Q I-10.0068 0.0199 2 R I-1 0.0139 0.0406 2 S II-1 0.0144 0.0406

On top of the photosensitive layer, a solution in water with thecomposition as defined in Table 3 was coated and was dried at 110° C.for 2 minutes.

TH-1 means mercaptobenzthiazole (MBT) and

TH-2 means mercaptobenzoxazole (MBO).

TH-3 means Neopentylalcohol mono(3-mercaptopropionate)

TABLE 3 Parts by Weight Component (g) partially hydrolyzedpolyvinylalcohol (degree of 17.03 hydrolysis 88%, viscosity 4 mPa · s ina solution of 4 wt. % at 20° C.). partially hydrolyzed polyvinylalcohol(degree of 7.43 hydrolysis 88%, viscosity 8 mPa · s in a solution of 4wt. % at 20° C.). fully hydrolyzed polyvinylalcohol (degree of 14.87hydrolysis 98%, viscosity 6 mPa · s in a solution of 4 wt. % at 20° C.).CA 24 E 0.26 Metolat FC 355 0.38 Lutensol A8 (90%) 0.032 Water 960The resulting formed protective overcoat had a dry thickness of 2.0g/m².

The imaging was carried out with an experimental violet plate setterdevice (flat bed system) equipped with a violet laser diode emittingbetween about 392 nm and about 417 nm. The following imaging conditionswere used:

Scanning speed: 1000 m/sec

Variable image plane power: 0 to 10.5 mW

Spot diameter: 20 μm

Addressability: 1270 dpi

Fixed laser energy setting of 86 μJ/cm²

After imaging, the plate was processed in an Agfa VSP85 processor at aspeed of 1.2 m/min. During the processing the plate was first heated(pre-heat step), next the protective overcoat was washed off and thephotolayer was processed in a water based alkaline developer (Agfa PD91)at 28° C. After a water rinsing and gumming step the printing plate wasready. A 13-step exposure wedge with density increments of 0.15 was usedto determine the sensitivity of the plate.

The results of the exposure tests are shown in Table 4 as the sum of thedensity of the UGRA step wedges measured by a Gretag Macbeth D19Cdensitometer (cyan setting). One fully hardened step=1.00. Higher valuesindicate higher sensitivity of the plate.

In Table 4 is given for every experiment (composition) the mean valuemeasured for two plates that were separately coated, and therefore ahighly reliable value. By this experimental procedure, variations inresults due to slight differences in temperature during exposure, laserpower, brush pressure in developing bath and human error in making ofstock solutions and coatings, were eliminated. In experiment 2 the valuefor composition L is the mean value from 6 plates, to have a veryreliable reference point.

TABLE 4 Co- UGRA Sum Example Experiment initiator mean value 1 A TH-10.06 comparison 1 B TH-1 1.93 comparison 1 C TH-1 3.05 comparison 1 DTH-1 3.92 comparison 1 E TH-1 4.00 comparison 1 F TH-1 4.12 comparison 1G TH-1 4.06 comparison 1 H TH-1 3.86 comparison 1 I TH-1 3.31 comparison1 J IV-1 5.26 invention 1 K IV-1 5.30 invention 2 L TH-1 3.86 comparison2 M III-1 4.48 invention 2 N TH-3 no image comparison 2 O TH-2 3.33comparison 2 P TH-2 3.89 comparison 2 Q I-1 4.30 invention 2 R I-1 4.76invention 2 S II-1 5.21 invention

The absolute sensitivity for all examples of the preferred embodimentsof the present invention was higher than about 100 μJ/cm². Toillustrate, an UGRA sum of about 3.86 for experiment L corresponds to asensitivity of about 68 μJ/cm². It can be clearly seen that themulti-functional thiol co-initiators give rise to plates with a highersensitivity than standard mono-functional co-initiators such asmercaptobenzthiazole (TH-1) or mercaptobenzoxazole (TH-2). Comparison ofIII-1 with TH-3 also surprisingly shows that an SH functionality of morethan 1 is essential for this type of compound. Experiments A to I showthat varying the concentration of (TH-1) in the photolayer over a widerange does not lead to sensitivity as high as plates containing themulti-functional thiols. For each multi-functional thiol of thepreferred embodiments of the present invention, an optimum concentrationin the photolayer can be found by common optimization experiments.

While preferred embodiments of the present invention have been describedabove, it is to be understood that variations and modifications will beapparent to those skilled in the art without departing the scope andspirit of the present invention. The scope of the present invention,therefore, is to be determined solely by the following claims.

What is claimed is:
 1. A lithographic printing plate precursorcomprising: a photopolymerizable composition, the composition includinga binder, a polymerizable compound, a sensitizer, a photoinitiator, anda polythiol compound; wherein the composition includes, with respect toits total solid weight, at least about 0.01 wt. % of the polythiolcompound and the polythiol compound is selected from one of thefollowing formulae (IIIa) or (IIIb):

wherein R⁸ mutually independent means H or a non-metal atom substituent;A¹, A² mutually independent mean a linear alkylene chain with at most 16carbon atoms; L³, L⁴ mutually independent mean linking groups or singlebonds; s means an integer from 1 to 100; r means 1, 2, 3, or 4; theproduct of s times r is 2 or an integer greater than 4; for polythiolesof formula (IIIa), R⁸ means methyl or ethyl; and the thiol groups offormulae (IIIa) and (IIIb) may also be present in their tautomericthione form.
 2. The lithographic printing plate precursor according toclaim 1, wherein L³, L⁴ mutually independent mean alkylene, alkyleneoxy,or polyglycerol; or an alkylene chain containing acyloxy, ether,carbonate, thioether, hydroxy, phenyl, heterocylic, amino, thiol,sulphonyl, amido, urethane, or urea functions.
 3. The lithographicprinting plate precursor according to claim 1, wherein R⁸ meanshydrogen, methyl, or ethyl; s means 1; L³, L⁴ mean alkylene; and r means2.
 4. The lithographic printing plate precursor according to claim 1,further comprising an additional sulfur containing compound as a chaintransfer agent.
 5. The lithographic printing plate precursor accordingto claim 1, wherein a minimum exposure for image formation, measured ona surface of the plate, is about 100 μJ/cm² or less.
 6. A method ofmaking a lithographic printing plate comprising the steps of: providinga photopolymer printing plate precursor as defined in claim 1; exposingthe printing plate precursor with a laser having an emission wavelengthin the range from about 300 nm to about 600 nm; heating the plate to atemperature, when measured at a rear surface of the plate, of about 90°C. to about 150° C., for a time between 10 seconds and 1 minute; andprocessing the printing plate precursor in an aqueous alkalinedeveloper.